Repetitive Hole-Mask Colloidal Lithography for the Fabrication of Large-Area Low-Cost Plasmonic Multishape Single-Layer Metasurfaces

Nanostructuring for tailored optical functionality suffers from a lack of methods for large-area and low-cost fabrication. While electron beam lithography allows different complex shapes to be deposited onto the same substrate layer, the writing process is sequential and the fabrication is very expensive. Large-area methods, such as nanosphere lithography, [ 1 ] colloidal lithography using shadow-angle evaporation, [ 2 ] as well as hole-mask colloidal lithography [ 3 ] all enable the creation of complex plasmonic structures. These methods have already permitted the manufacture of Fano resonant sensors, [ 4 ] nanoantennas for enhanced detection of infrared (IR) vibrations, [ 5 ] nanoplasmonic hydrogen sensing, [ 6–8 ] and 3D plasmonic nanostructures. [ 9,10 ]